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Semiconductor

All I-Line Photoresist Bump Photoresist KrF Photoresist TSV Thick Photoresist BARC TARC Developer Etchant Promoter Rinsing Solution Spin On Carbon Hardmask CMP Wafering

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Etchant

화학적 반응을 활용하여 인쇄회로 기판에 존재하는 불필요한 금속을 제거하기 위해 사용하는 물질입니다.
YMCA-M128

Word-line(Mo/TiN) recess wet-etch solution.
YMCA-W096

Word-line(W/TiN) recess wet-etch solution.
CL-Y200

Polysilicone etchant for Quartz tube
YSG-402E

SiGe etchant

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