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I-Line Photoresist
Bump Photoresist
KrF Photoresist
TSV Thick Photoresist
BARC
TARC
Developer
Etchant
Promoter
Rinsing Solution
Spin On Carbon Hardmask
CMP
Wafering
A Total of
5
hit(s)
Subject
Contents
Name
BARC
(Bottom Anti Refective Coating)반도체 소자의 패턴 크기가 감소함에 따라 노광 공정이 진행되는 동안 반사율이 최소 1% 미만으로 유지되어야 균일한 패턴을 형성할 수 있으며, lithography를 이용한 패턴 형성 중 노광 시 막 하부층에 의한 빛 반사 방지 및 정제파 제거 용도의 흡광제와 이를 포함하는 유기 반사 방지막입니다.
YA-800
(Bottom Anti Refective Coating Materials)
-Target : Thickness 0.08um
-Purpose of use : ArF BARC
YA-600A
(Bottom Anti Refective Coating Materials)
-Target : Thickness 0.06um
-Purpose of use : Gapfill BARC
YA-400
(Bottom Anti Refective Coating Materials)
-Target : Thickness 0.04um
-Purpose of use : ArF BARC
YCB-240
(Bottom Anti Refective Coating Materials)
-Target : Thickness 0.024um
-Purpose of use : TSV package BARC – Ball grid array bumping process
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