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In 2001, YCCHEM was established and entered a semiconductor process materials business, and has been engaged in continuous R&D investments, key technical personnel fostering, and manufacturing-based investment expansion. Through all this, we have developed and commercialized a pattern collapse prevention solution in the ArF process by using special surfactants and polymers in relation to the semiconductor process materials in the cutting-edge field. Based on the built up technology, we have developed a pattern collapse prevention solution for EUV process and a developer for EUV process in 2016. In addition, we have developed cleaning solutions to improve photo mask developer’s developing capability and profile, prevent capacitor’s collapse, and help cleaning, and various KrFs by which high thickness and high resolution are possible, i-line photoresists, BARC, SOC, CMP slurries, and thinner. In this manner, we have been committed to diversifying semiconductor materials and developing new materials, and have been contributing to the Korean semiconductor industry’s development and innovation. We at YCCHEM will do our very best to provide semiconductor materials in order to maximize customer satisfaction based on customer reliability.