Semiconductor

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Semiconductor

All I-Line Photoresist Bump Photoresist KrF Photoresist TSV Thick Photoresist BARC TARC Developer Etchant Promoter Rinsing Solution Spin On Carbon Hardmask CMP Wafering

A Total of 3 hit(s)

Developer

Photo 공정의 마지막 단계인 현상 공정에서 활용되는 물질로써, 노광된 영역과 노광되지 않은 영역을 선택적으로 제거하여 회로에 패턴을 형성하는 공정시 사용하는 물질입니다.
DE-Y250L

TMAH type developer for color filter resist
DV-7000D / DE-Y2200 / DV-400 / DV-400S

TMAH type developer

이전10페이지

이전1페이지

1

다음1페이지

다음10페이지

Company Profile Location R&D Inquiries

HEAD OFFICE, 1st, 2nd, 3rd Factory : 174-12, Yuseori-gil, Seonnam-myeon, Seongju-gun, Gyeongsangbuk-do, South Korea.
T. +82-54-930-2500 F. +82-54-931-8521 4th Factory, SEONGJU GENERAL INDUSTRIAL COMPLEX : 49, Seongjusaneopdanji-ro, Seongju-eup, Seongju-gun, Gyeongsangbuk-do, South Korea.
T. +82-54-930-2800 F. +82-54-930-2811

2nd R&D Center(Siheung) : 50, Eungyenam-gil, Siheung-si, Gyeonggi-do, Korea
T. +82-31-702-3941 Branch Office(Singapore) : 65 Chulia St, #46 33 OCBC Centre, Singapore 049513
T. +65-6670-6629

Liaison Office(New Jersey U.S.A.) : 460 Bergen Blvd. Suite 262. Palisades Park, New Jersey 07650, USA
T. +1-201-944-0107

COPYRIGHTⒸ 2020 YCCHEM CO.,Ltd. ALL RIGHT RESERVED.

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