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Semiconductor
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I-Line Photoresist
Bump Photoresist
KrF Photoresist
TSV Thick Photoresist
BARC
TARC
Developer
Etchant
Promoter
Rinsing Solution
Spin On Carbon Hardmask
CMP
Wafering
A Total of
5
hit(s)
Subject
Contents
Name
Rinsing Solution
Photo 공정 시 활용되는 물질로써, Developer 공정 후 D.I. water를 활용한 세척 시 발생 되는 패턴의 손상을 방지하기 위해 사용하는 물질입니다.
ALS-Y957
-Improving the process margin by reducing the cap-leaning after etching
AYCIP-8260
Positive PR for 365nm process
PLECT-100 / PLECT-200
-Target : Prevent collapse & Improvement of LER
-Purpose of use : ArF photoresist
ATL-1008
-Target : Prevent collapse & Improvement of LER
-Purpose of use : KrF photoresist
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