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Transparent Photoresist
UV Imprint Resin
Stripper
LED
LCD
A Total of
5
hit(s)
Subject
Contents
Name
YMR-2100
A material used to remove impurities existing after the etch process.
DV-2379LC
As a material used in the last stage of the photo development process, it is used for performing the process in which patterns are formed in the circuit by selectively removing the exposed and non-exposed areas.
LCR-Y110N / LCR-Y200A / CL-Y300A
In the mechanism of the photoresist composition, acid is formed in the photo acid generator that gets light from the exposure process, and the acid causes the resin's acid catalysed reaction in the photoresist. When using the negative photoresist, a bridging reaction occurs, and patterns are formed with solubility difference of the developer (development liquid) in the exposed and non-exposed areas through the reaction.
SCR-100
In the mechanism of the photoresist composition, acid is formed in the photo acid generator that gets light from the exposure process, and the acid causes the resin's acid catalysed reaction in the photoresist. When using the negative photoresist, a bridging reaction occurs, and patterns are formed with solubility difference of the developer (development liquid) in the exposed area and non-exposed area through the reaction.
LCD
This polymer material enables a response to a specific wavelength's light and specific patterns to be copied. It is also used in the exposure (lithography) process among the TFT-LCD circuit element processes.
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