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I-Line Photoresist
Bump Photoresist
KrF Photoresist
TSV Thick Photoresist
BARC
TARC
Developer
Etchant
Promoter
Rinsing Solution
Spin On Carbon Hardmask
CMP
Wafering
A Total of
5
hit(s)
Subject
Contents
Name
Rinsing Solution
As a material used in the photo process, this is a material used to prevent pattern damage that occurs while rinsing with D.I. water, after the developer process.
ALS-Y957
Improving the process margin by reducing the cap-leaning after etching
ERAC / AYCER series
-Target : Prevent collapse & Improvement of LER
-Purpose of use : EUV photoresist
PLECT-100 / PLECT-200
-Target : Prevent collapse & Improvement of LER
-Purpose of use : ArF photoresist
ATL-1008
-Target : Prevent collapse & Improvement of LER
-Purpose of use : KrF photoresist
1
